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Syllabus ( PHYS 623 )


   Basic information
Course title: Lithography
Course code: PHYS 623
Lecturer: Prof. Dr. Numan Akdoğan
ECTS credits: 7.5
GTU credits: 3 (3+0+0)
Year, Semester: 1/2/3/4, Fall and Spring
Level of course: Third Cycle (Doctoral)
Type of course: Area Elective
Language of instruction: English
Mode of delivery: Face to face , Group study , Lab work
Pre- and co-requisites: İngilizce
Professional practice: No
Purpose of the course:
   Learning outcomes Up

Upon successful completion of this course, students will be able to:

  1. Use cleanrooms, fundamentals of optical lithography techniques, chemistry of lithography and chemical processing techniques

    Contribution to Program Outcomes

    1. Define and manipulate advanced concepts of Physics in a specialized way
    2. Apply physical principles to real-world problems
    3. Gain original, independent and critical thinking, and develop theoretical concepts and tools,
    4. Understand relevant research methodologies and techniques and their appropriate application within his/her research field,
    5. Analyze critically and evaluate his/her findings and those of others,
    6. Question and find out innovative approaches.
    7. Continuously develop their knowledge and skills in order to adapt to a rapidly developing technological environment
    8. Develop an awareness of continuous learning in relation with modern technology
    9. Write progress reports clearly on the basis of published documents, thesis, etc

    Method of assessment

    1. Seminar/presentation
    2. Term paper
  2. Apply Optical mask design and laser lithography, Optical mask production, mask aligners

    Contribution to Program Outcomes

    1. Define and manipulate advanced concepts of Physics in a specialized way
    2. Apply physical principles to real-world problems
    3. Gain original, independent and critical thinking, and develop theoretical concepts and tools,
    4. Question and find out innovative approaches.
    5. Work effectively in multi-disciplinary research teams,
    6. Continuously develop their knowledge and skills in order to adapt to a rapidly developing technological environment
    7. Develop an awareness of continuous learning in relation with modern technology

    Method of assessment

    1. Seminar/presentation
    2. Term paper
  3. Apply Chemical micro and nanofabrication techniques, Plasma etch techniques

    Contribution to Program Outcomes

    1. Define and manipulate advanced concepts of Physics in a specialized way
    2. Apply physical principles to real-world problems
    3. Understand relevant research methodologies and techniques and their appropriate application within his/her research field,
    4. Analyze critically and evaluate his/her findings and those of others,
    5. Work effectively in multi-disciplinary research teams,
    6. Continuously develop their knowledge and skills in order to adapt to a rapidly developing technological environment
    7. Develop an awareness of continuous learning in relation with modern technology

    Method of assessment

    1. Seminar/presentation
    2. Term paper
   Contents Up
Week 1: Cleanroom classification and why we need a cleanroom? Cleanroom usage protocals, cleanroom gowning, the use of chemicals and their disposal from cleanrooms.
Week 2: Fundamentals of Microlithography and introduction to microfabrication
Week 3: Chemical reactions in microlithography and micro fabrication. Chemical cleaning of samples. Selection of materials, photoresists and fundamental limits.
Week 4: CLEWIN mask design software module 1
Week 5: CLEWIN mask design software module 2
Week 6: Photomask design and design hierarchy. Material and photoresist selection.
Design of 2 masks for Hall effect measurements.
Week 7: Writing photomasks with laser lithography system (Heidelberg DWL66) and their fabrication.
Week 8: Mask aligners and photolithography techniques, photodeveloping and the use of photochemicals.
Week 9: Chemical etching of metals and semiconductors, chemical etchants, selective chemical etching, and fundamental limits. Isotropic and anisotropic etching.
Week 10: Micro and nano fabrication using chemical and physical plasma etch techniques.
Week 11: Project: 3 mask design
Week 12: Project: Material selection
Week 13: Project: Photolithograply and microfabrication with chemical etching.
Week 14: Project
Week 15*: Project
Week 16*: Project
Textbooks and materials: Handbook of Microlithography, Micromachining, and Microfabrication. Volume 1: Microlithography (SPIE Press Monograph Vol. PM39) Hardcover – March 14, 1997
Recommended readings: Fundamental Principles of Optical Lithography: The Science of Microfabrication Paperback – December 17, 2007
  * Between 15th and 16th weeks is there a free week for students to prepare for final exam.
Assessment Up
Method of assessment Week number Weight (%)
Mid-terms: 0
Other in-term studies: 0
Project: 11-16 100
Homework: 0
Quiz: 0
Final exam: 0
  Total weight:
(%)
   Workload Up
Activity Duration (Hours per week) Total number of weeks Total hours in term
Courses (Face-to-face teaching): 3 16
Own studies outside class: 4 16
Practice, Recitation: 3 16
Homework: 0 0
Term project: 3 6
Term project presentation: 2 6
Quiz: 0 0
Own study for mid-term exam: 0 0
Mid-term: 0 0
Personal studies for final exam: 0 0
Final exam: 0 0
    Total workload:
    Total ECTS credits:
*
  * ECTS credit is calculated by dividing total workload by 25.
(1 ECTS = 25 work hours)
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